Feng Lei，Zheng T ao，L i Daohuo
（Anhui Institute of Optics ＆Fine M echanics，Academia Sinicia，Hefei230031）
Abstract
In this paper，the principle and the empirical formulas of the preparation for nanometer sized a-Si3N4 particles by laser induced chemical vapor deposition （ LICVD ） are given． Under certain technological parameters，the high quality nanometer a-Si3N4 particles whose average diameter is about 10nm are obtained．The studies of IR and Raman show that there are Si－N ，Si－H，N －H，Si－O －Si bonds in a-Si3N4．An analysis of Raman spectra of a-Si3N4 for thermal treatment in various temperature and atmosphere are made．
Keywords：amorphous Si3N4；nano-partical；laser induced chemical vapor depostion method
DOI：10.13732/j.issn.1008-5548.1999.03.001
