摘要：给出激光化学气相沉积法制备 a-Si3N4 纳米粒子的原理和经验公式，在特定工艺参数下获得平均粒径为10nm左右的优良 a-Si3N4 纳米粒子。 红外吸收和拉曼光谱研究表明，a-Si3N4 纳米粒子中存在 Si－N，Si－H，N－H，Si－O－Si键，分析了 a-Si3N4 纳米粒子在不同的温度和气氛退火后的变化情况。
关键词：非晶态氮化硅；纳米粒子；激光化学气相沉积法
Abstract：In this paper，the principle and the empirical formulas of the preparation for nanometer sized a-Si3N4 particles by laser induced chemical vapor deposition（ LICVD ） are given．Under certain technological parameters，the high quality nanometer a-Si3N4 particles whose average diameter is about 10nm are obtained．The studies of IR and Raman show that there are Si－N ，Si－H，N －H，Si－O －Si bonds in a-Si3N4．An analysis of Raman spectra of a-Si3N4 for thermal treatment in various temperature and atmosphere are made．
Key words：amorphous Si3N4；nano-partical；laser induced chemical vapor depostion method
