摘要：以碳酸铈为铈源,以硅溶胶为硅源,通过喷雾干燥法制备CeO2-SiO2复合氧化物前驱体,再通过煅烧得到复合抛光粉;利用X射线衍射、扫描电子显微镜、激光粒度仪、zeta电位仪对复合抛光粉的晶体结构、表面形貌、粒径分布、zeta电位进行表征,并进行抛光性能研究。结果表明:当CeO2与SiO2的质量比大于2∶1时,复合抛光粉中的SiO2能完全掺杂到CeO2中,并且抛光效果优于CeO2和SiO2抛光粉的;当CeO2与SiO2的质量比为4∶1时,复合抛光粉的粒径d₅₀为0.985μm,抛蚀量为0.2960 g,表面划痕少,抛光效果最好。

关键词：喷雾干燥；掺杂；复合抛光粉；抛光

Abstract： The precursor of CeO2-SiO2 composite polishing powders was obtained by the method of spray drying with cerium carbonate as cerium resource and silicon soliquid as silicon resource. The composite polishing powders were obtained by calcining. XRD, SEM, laser particle sizer, zeta potential analyzer were used to characterize the crystal structure, surface morphology, particle size and zeta potential. The polishing effect of composite polishing powdes was studied. The results show that SiO2within composite polishing powders can completely dope in CeO2 when the mass ratio of cerium oxide to silicon oxide is larger than 2∶1, and the polishing effect of composite polishing powders is better than that of CeO2 and SiO2. When the mass ratio of cerium oxide to silicon oxide is 4:1, the particle size of the powders is 0.985 μm, the burnishing mass is 0.296 0 g, the superficial scratches are few, and the polishing effect of composite polishing powder achieves the best.

Keywords: spray drying; doping; composite polishing powder; polishing