张旭斌， 钟景翔， 刘帅， 王富民

天津大学 化工学院， 天津 300072

引用格式：

张旭斌， 钟景翔， 刘帅， 等. 超纯水中有机碳及痕量尿素去除技术进展［J］. 中国粉体技术， 2026， 32（5）： 1-10.

Zhang Xubin， Zhong Jingxiang， Liu Shuai， et al. Advances in removal technologies of organic carbon and trace urea from ultrapure water［J］. China Powder Science and Technology， 2026， 32（5）： 1-10.

DOI：10.13732/j.issn.1008-5548.2026.05.007

收稿日期： 2026-03-16， 修回日期： 2026-05-31，上线日期： 2026-网上出版日期:06-18。

基金项目：山东省重点研发计划（重大科技创新工程），编号 ：2023CXGC010601；山东省自然科学基金项目，编号：ZR2023ZD22；国家自然科学基金项目，编号：22479109。

第一作者：张旭斌（1970—），男，教授，博士，博士生导师，研究方向为反应工程以及工业催化。E-mail：tjzxb@tju.edu.cn。

摘要：【目的】探讨不同技术对超纯水中有机碳及痕量尿素的去除效果与影响机制，深入剖析不同工艺的优势、局限性与适配场景，实现高效深度去除有机碳。【研究现状】综述目前超纯水生产过程中的传统有机碳去除工艺，包括反渗透、离子交换和紫外辐照等多级协同工艺；针对超纯水生产过程中尿素的去除，探究了生物降解法、物理吸附法、高级氧化法等一系列方法。【结论与展望】在超纯水生产过程中，以反渗透、离子交换、紫外光辐照为代表的传统工艺能有效去除大部分有机碳，但对尿素这类电中性、小分子、化学性质稳定的杂质去除效率甚微；高级氧化法展现出对痕量尿素的高效降解潜力，已成为当前研究的前沿与重点；集成化、低能耗的绿色技术是未来发展方向，但膜污染、能耗高及中性小分子去除效率低等问题仍须解决。

关键词：超纯水；有机碳；痕量尿素；高级氧化法；集成工艺

Abstract

Significance Ultrapure water is a critical foundational material in the manufacturing of semiconductor chips. Its quality directly determines the yield and performance of integrated circuits. The rapid advancements in semiconductor fabrication technology impose exceptionally stringent standards for ultrapure water purity. The diversification of feed water sources， particularly the increasing use of reclaimed water， introduces new types of persistent organic contaminants. Among these， urea has emerged as a particularly challenging component. The aim of this study is to systematically review current technologies for removing total organic carbon and trace urea from ultrapure water. This will help ensure a continuous， stable， and high standard supply of electronic grade ultrapure water to meet the escalating demands of the semiconductor industry.

Progress Conventional technologies for total organic carbon removal primarily include reverse osmosis， ion exchange resin， and ultraviolet irradiation. These form the cornerstone of mainstream ultrapure water production. These technologies operate in a synergistic， multi stage process. Reverse osmosis， typically positioned at the front end， utilizes nanoscale pores for physical sieving and employs electrostatic repulsion to remove larger organic molecules. While dual stage reverse osmosis can enhance system robustness， its efficiency is limited for small， uncharged molecules. Ion exchange resin mainly removes ionizable organic carbon through ion exchange. Its effectiveness for neutral molecules relies on weak physical adsorption by the resin matrix. Ultraviolet irradiation， especially at a wavelength of one hundred eighty five nanometers， is a critical polishing step. It decomposes residual organic matter by generating hydroxyl radicals through water photolysis， effectively degrading small molecules like methanol and isopropanol. However， the combination of these conventional processes shows minimal removal efficiency for trace urea. This inefficiency is due to urea's small molecular size， electrical neutrality， high water solubility， and chemical stability. This limitation has driven the development of specialized urea removal technologies. Biodegradation uses immobilized urease enzymes for the specific hydrolysis of urea into ammonia and carbon dioxide， offering a green solution. However， it faces challenges related to enzyme stability and cost. Physical adsorption relies on materials like activated carbons or inorganic adsorbents. Their surfaces are often modified， for example by introducing carboxyl or amino groups， to enhance urea capture via hydrogen bonding. Yet， at trace concentrations， this method faces limitations in capacity and selectivity. Among all methods， advanced oxidation processes have shown the most promising potential for efficient trace urea degradation. Techniques such as ultraviolet activated persulfate or ultraviolet combined with halogen systems generate highly reactive radicals. These radicals attack and mineralize urea in a non selective manner. Research into reaction mechanisms reveals pathways to optimize degradation rates. The efficient integration of advanced oxidation process units with existing reverse osmosis， ion exchange resin， and ultraviolet polishing steps， while managing by products like nitrate or halogenated compounds， is crucial for practical application.

Conclusions and Prospects In summary， while standard processes effectively remove most organic carbon， they fail against trace urea. Advanced oxidation processes have become the leading research focus due to their high degradation potential. Future development must center on creating integrated， low-energy， and intelligent systems. This involves optimizing process combinations， developing targeted green technologies for stubborn contaminants like urea， creating solutions for new water sources， implementing smart monitoring for stable operation， and carefully managing any new impurities introduced by these advanced methods. The overarching goal is to advance towards more sustainable and efficient ultrapure water production.

Keywords： ultrapure water； organic carbon； trace urea； advanced oxidation process； integrated process

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