ISSN 1008-5548

CN 37-1316/TU

2020年26卷  第4期
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KH550改性微米二氧化硅的条件优化

Condition optimization of KH550 modified micron silica

Doi:10.13732/j.issn.1008-5548.2020.04.006
作者:朱耿增,李文静,王晓明,李辛庚,姜波

摘要:为了改善微米二氧化硅在实际应用中的分散性,在高沸点正丁醇分散剂中,采用硅烷偶联剂氨丙基三乙氧基硅烷对微米二氧化硅进行表面接枝改性,研究反应时间、反应温度、偶联剂用量对微米二氧化硅改性效果的影响;并利用傅里叶红外光谱仪、接触角测试、场发射扫描电镜对改性前后的粒子进行表征分析。结果表明:当反应时间为6 h,反应温度为90℃,偶联剂质量分数为11%时,改性后的微米二氧化硅接触角达到153°,分散性最好。

关键词:微米二氧化硅;硅烷偶联剂;接枝改性;接触角

Abstract: In order to improve the dispersion of micron silica in practical application,in a high boiling point n-butanol dispersant,the surface grafting modification of micron silica was carried out with the coupling agent aminopropyl triethoxylsilane.The effects of reaction time,reaction temperature and the amount of coupling agent on the modification effect of micron silica were studied.The modified particles were characterized by Fourier infrared spectrometer,contact angle test and field emission scanning electron microscope.The results show that when the reaction time is 6 h,the reaction temperature is 90 ℃,and the mass fraction of the coupling agent is 11% ,the contact angle of the modified micron silica reaches 153 °,and the dispersion is the best. 

Keywords: micron silica; silane coupling agent; grafting modification; contact angle